ACM Research, a two-year-old Californian company, says it can see the end of the road for chemical mechanical polishing (CMP), and is looking to move in on the market with a non-contact process. It ...
SAN JOSE — KLA-Tencor Corp. here rolled out what the company says is the industry's first production-worthy, in-situ film thickness and end-point control system for copper metal polishing in chemical ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--June 25, 2003--Applied Materials, Inc. (Nasdaq:AMAT) announces Reflexion(R) LK, the industry's only low down force, high throughput CMP (chemical mechanical ...
You are able to gift 5 more articles this month. Anyone can access the link you share with no account required. Learn more. FAIRFIELD— Fairfield police are investigating the theft of about $3,000 ...
Chemical Mechanical Planarization (CMP) is a critical process in the semiconductor, LED wafer, and hard disk manufacturing industry and is used to achieve the substrate wafer's required planarity.
Addressing Thin Film Thickness Metrology Challenges Of 14nm BEOL Layers This paper describes a method to effectively monitor the film stack at different metal CMP process steps using a spectroscopic ...
Chemical Mechanical Planarization is a semiconductor manufacturing process that uses slurries consisting of abrasive particles and ancillary chemicals to clean and condition semiconductor wafers ...
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